亚洲综合色自拍一区,少妇久久久久久人妻无码,中国精品偷拍区偷拍无码,极品妇女扒开粉嫩小泬

LankeCMS LOGO
Featured Products
Silicon Wafer
View Detailed
SOI Wafer
View Detailed
SiO2 Wafer
View Detailed
TiO2
View Detailed
GaSb Wafer
View Detailed
InSb Wafer
View Detailed
sapphire substrate
View Detailed
Ge Wafer
View Detailed
Filter
View Detailed
PRODUCTS LIST Home > Product Show
sapphire substrate

Product Numbers: 2012121372342

Place:

Product description:sapphire substrate,sapphire substrate factory

INTRODUCTION

           Product Specification

Crystal Materials

99,996% of Al2O3,High Purity, Monocrystalline, Al2O3

Crystal quality

Inclusions, block marks, twins, Color, micro-bubbles and dispersal centers are non-existent

Diameter

2inch

3inch

4inch

5inch 7inch

50.8± 0.1mm

76.2±0.2mm

100±0.3mm

In accordance with the provisions of standard production

Thickness

430±15μm

550±15μm

650±20μm

In accordance with the provisions of standard production

330±15μm

500±15μm

550±20μm

250±15μm

430±15μm

500±20μm

Orientation

C- plane (0001) to M-plane (1-100) or A-plane(1 1-2 0) 0.2±0.1° /0.3±0.1°, R-plane (1-1 0 2), A-plane (1 1-2 0 ), M-plane(1-1 0 0), Any Orientation , Any angle

Primary flat length

16.0±0.8mm

22.0±1.0 mm

32.5±1.5 mm

In accordance with the provisions of standard production

Primary flat Orientation

A-plane (1 1-2 0 ) ± 0.2°

TTV

≤10μm

≤15μm

≤20μm

≤30μm

LTV

≤10μm

≤15μm

≤20μm

≤30μm

TIR

≤10μm

≤15μm

≤20μm

≤30μm

BOW

≤10μm

≤15μm

≤20μm

≤30μm

Warp

≤10μm

≤15μm

≤20μm

≤30μm

Front Surface

Epi-Polished (Ra< 0.2nm)

Back Surface

Fine ground (Ra=0.5 to 1.2 μm), Epi-Polished (Ra< 0.2nm)

Note

Can provide high-quality sapphire substrate wafer according to customers' specific requirement

Links:Instrument  |   9Hui Tech  |   semi  |   coema  |   Background Management  |  
  Beijing Jiaanheng All rights reserved  京ICP備12052793號(hào)
  Add:Beijing China Tel:010-88681435 Fax:010-58872911
射阳县| 宾阳县| 双桥区| 永州市| 抚远县| 江陵县| 塔城市| 墨竹工卡县| 平顶山市| 抚宁县| 潢川县| 阳原县| 东辽县| 徐闻县|